WOE產品相關應用 ~ 3D Dynamic Scanning & Printing 3D動態掃描和列印 。AR/VR 增強現實/虛擬現實 。Laser Cleaning 雷射清洗 。Laser Cutting 雷射切割 。Laser Drilling雷射鑽孔 。Laser Engraving雷射雕刻 。Laser Lift-Off 雷射剝離 。Laser Processing 雷射加工。         Laser Scanning 雷射掃描 。 Laser Welding 雷射焊接 。 Mass Temperature Screening 質量溫度篩選 。 Medical Laser Treatment 醫療雷射治療 。 Medical Optical Imaging 醫學光學成像等         WOE新加坡波長光電相關產品 ~ Focus Lens聚焦鏡 。Ronar-Smith 。LASER OPTICS 。Beam Expander擴束鏡 。Bessel Lens貝塞爾透鏡 。F-Theta Scan Lens掃描鏡頭 。MEDICAL LASER OPTICS 。INFRARED OPTICS 。Telecentric Scan Lens遠心掃描鏡頭         光研全新代理Essent Optics 系列光譜儀 Photon RT & Linza 150 Spectrophotometers         PD-Harold VCSEL Laser Module        

Introducing SimphoSoft v.3.1 Software for Simulation of Laser Dynamics 

in Ho-doped / Tm-doped / Ho - Tm co-doped Materials at Wavelengths near 2 um



SimphoSoft Software Features

Single and co-doped materials / CW, Single-pulse or multiple-pulse (femto, pico, nano seconds) / Gaussian, Sech^2 and square-like temporal profile / Arbitrary input pulse energies / Single-wavelength or multi-wavelength / Radially symmetric Gaussian profile incident beams / Nonlinear absorbers, multiple absorbers, multiple layers  / Optimization of photophysical or experimental parameters / Solve inverse problem / Analyze effects of material impurities / Database of photophysical parameters / Library of common photo-active materials / Smooth, user-friendly GUI CAD environment / Extensive set of clear, versatile graphical output options / Convenient interface for porting results of simulations to other modeling software and applications.





Figureshows the Gain as a function of Amplifying Material Length (Tm - doped material) for three incident input pulse energies, e.g. 4mJ, 6mJ and 8mJ at wavelength near 2 um using 790 nm pump light. The similar type of simulations can be done for Ho - dopedor any combinations of Ho - Tm co-doped or other Rare Earth co-doped materials for input pulses of arbitrary widths (down to femtoseconds), arbitrary repetition rates and arbitrary energy levels.


Figureshows the electron population densities of ground state at the sample input surface (blue line) and at the mid‐point of the amplifier material (orange line) during the time that the pump pulse is passing through the sample. At the sample input surface, the population of the ground state is nearly depleted by the pump beam, which can affect the amplification efficiency as once the ground state is depleted of ions, the state will no longer absorb the pump light.